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Boron carburide is a high-performance carbon compound, which is composed primarily of boron, carbon, and other elements. The chemical formula for B4C is B4C. It is widely used by industries, the military, aerospace and other fields because of its characteristics, such as high heat transfer and high melting points. The article will give a detailed description of the physical properties and chemical composition, as well a performance characterization and application fields.
Boron carbide, a non-metallic inorganic material with a density of 2.52g/cm3, is a dense inorganic. It has a cubic lattice structure, a black lustre, and a density of 2.52g/cm3. Boron carbide exhibits a low electrical conductivity of only 10-6S/m, and has excellent insulation. Its thermal conductivity (97W/m*K) is lower than metals, silicon and ceramics but higher than glass and other materials.
Boron carbide exhibits chemical stability, and it is not reactive to acids and alkalis. B4C is reactive with O2, H2O and other substances. High temperatures can generate B2O3, CO etc. B4C has anti-oxidant and corrosion resistance. This makes it a good choice for long-term usage in high-temperature, corrosive environments.
Preparation methods for boron carbide The main methods are the carbon thermal decomposition method, arc melting and chemical vapour deposit method.
Methode de réduction du carbothermal
Carbon thermal reduction (CTR) is widely used to prepare boron carbide . The reaction equation is B2O3+3C – B4C+CO. The reaction formula is B2O3+3C + B4C+CO. The reaction temperature ranges from 1500 to 1700°C. This method has the advantage of being simple, low-cost, and easy to use. However, the boron carbide produced is not of high purity.
Arc melting method
In the arc melting process, graphite electrodes are heated and melted in an arc with boric acid to create boron carbide. The reaction formula is B2O3+3C + B4C. The reaction temperature ranges between 18002000 degrees. The boron-carbide prepared using this method is high in purity, with fine particles. However, the process is complicated and expensive.
Chemical vapour deposition method
Chemical vapour deposition uses the reaction of gaseous carbon black and borane at high temperature to create boron carburide. The reaction formula is B2H6+6C B4C+6H2. Reaction temperature ranges between 1000-1200°C. This method yields boron-carbide with superfine particles and high purity, but is costly and complex.
Physical, chemical, mechanical, and other properties are primarily considered when describing the performance of boron carbide.
Density, conductivity, and thermal conductivity are the main physical properties of Boron carbide. Among these, the density is 2.52g/cm3, conductivity is 10-6S/m, and thermal conductivity 97W/m*K.
Boron carbide exhibits chemical stability, and it is not reactive to acids or alkalis. B4C is reactive with O2, H2O and other substances. High temperatures can generate B2O3, CO etc. B4C has anti-oxidant and corrosion resistance. This makes it suitable for long term use in environments with high temperatures and corrosion.
Boron carbide’s high hardness, melting temperature, and heat transfer make it a popular material in many industries. Hardness of 3500kg/mm2, melting point 2450, and heat transfer rate 135W/m*K are among the characteristics that make boron carbide so popular in industries, military, aerospace, and other fields.
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